File:Colloidal lithography steps.jpg

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English: Illustration of the four main steps of a nanosphere lithography process, depicting the sequence of: (a) the deposition of colloidal nano/micro-particles on a surface, which will act as mask; (b) reactive ion etching (RIE) for particle shaping, producing a non-close packed array; (c) material infiltration via physical deposition; (d) lift-off of the colloids leaving only the nano/micro-patterned material in between the particles. Image reused from: https://www.mdpi.com/2079-4991/11/7/1665 with permission from MDPI.
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Author Manuelmdm

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30 March 2021

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current11:54, 19 March 2023Thumbnail for version as of 11:54, 19 March 2023550 × 414 (73 KB)ManuelmdmUploaded own work with UploadWizard
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