File:Schematic cross-section of a device with corresponding material layers..png
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Summary
| Description |
English: Schematic cross-section of a device with corresponding material layers. The floating gate (FG), triple-barrier resonant-tunneling structure (TBRT), and readout channel are highlighted. Arrows indicate the direction of electron flow during program/erase operations. (Image credit: Lancaster University) |
| Date | |
| Source | ULTRARAM: A Low-Energy, High-Endurance, Compound-Semiconductor Memory on Silicon |
| Author | Peter D. Hodgson,Dominic Lane,Peter J. Carrington,Evangelia Delli,Richard Beanland,Manus Hayne |
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| Date/Time | Thumbnail | Dimensions | User | Comment | |
|---|---|---|---|---|---|
| current | 07:23, 8 April 2022 | | 322 × 256 (63 KB) | Avast rumali | Uploaded while editing "User:Avast_rumali/sandbox" on en.wikipedia.org |
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